http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7374956-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-34 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-544 |
| filingDate | 2002-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ec224ef8ee8ac2a842d56ba34b415cb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b36d5560e7016de73dab894ea7a9050 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_54517d060131abe3c5bd4e1404c18153 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b3c7846a7fcb1b8edbfb0db0509e5db |
| publicationDate | 2008-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-7374956-B2 |
| titleOfInvention | Method for improved metrology by protecting photoresist profiles |
| abstract | A method for preserving semiconductor feature opening profiles for metrology examination including providing semiconductor wafer having a process surface comprising semiconductor feature openings; blanket depositing over the semiconductor feature openings to substantially fill the semiconductor feature openings at least one layer of material comprising silicon oxide; and, preparing a portion of the semiconductor wafer in cross sectional layout for metrology examination. |
| priorityDate | 2002-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.