http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7354870-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3e1018b924ad1e238642eaad9d2172a7 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2363-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1653 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1651 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-208 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y10-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y40-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-31 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y70-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
| filingDate | 2005-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2008-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e6df9266c4c005b596df78443b0a9a1e |
| publicationDate | 2008-04-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-7354870-B2 |
| titleOfInvention | Process for chemical etching of parts fabricated by stereolithography |
| abstract | A process for chemically etching a stereolithography resin involves chemically etching a shaped object of the resin at a temperature in a range of from about 20° C. to about 30° C. for a time of from about 30 seconds to about 60 seconds with a saturated aqueous solution of permanganate, for example potassium permanganate. The process is faster, simpler and uses less environmentally harmful chemicals than previous etching processes for SLA parts. Etching is also more thorough and can reach hard to access places that sand blasting cannot. The etching process may be part of a process for metallization of a rapid prototyping part fabricated by stereolithography. Excellent etch coverage leads excellent coverage by the coating metal and to stronger metal layers. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2502728-A1 |
| priorityDate | 2005-11-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 53.