| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fdad00677b9268c26e005a9e03a7b9dd |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-288
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05B1-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31633
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05C11-10 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-288 |
| filingDate |
2004-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2007-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2de89141763f9d65c627c42871c0023d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aca34299a7288a2a54df123326be5ca2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b4cfe9a5ec9d6ca17a374dc863fa63a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b20e537c97a166f37b4bfb6583acd64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58cbb773b7b4b1596cf394abd01c6156
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aec04aa621cbf9327cd4dec631b2307 |
| publicationDate |
2007-12-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7312018-B2 |
| titleOfInvention |
Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatus |
| abstract |
There is disclosed a film forming method comprising continuously discharging a solution adjusted so as to spread over a substrate by a given amount to the substrate through a discharge port disposed in a nozzle, moving the nozzle and substrate with respect to each other, and holding the supplied solution onto the substrate to form a liquid film, wherein a distance h between the discharge port of the nozzle and the substrate is set to be not less than 2 mm and to be in a range less than 5×10 −5 qγ (mm) given with respect to a surface tension γ (N/m) of the solution, discharge speed q (m/sec) of the solution continuously discharged through the discharge port, and a constant of 5×10 −5 (m·sec/N) |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008064226-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009047418-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8173201-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009047419-A1 |
| priorityDate |
2002-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |