Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-427 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-68 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302 |
filingDate |
2004-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2007-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ec0c6366dc007d03e4b8261dd98cb82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ad24ae6d25e51e3f285000b076f3774 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5620bc6a221d8c6fae7c8794b98fb64c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_739fd7f7e1d8942f737f10eeb886588a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1da688270c29e54a6eb58ededc11b806 |
publicationDate |
2007-12-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7304000-B2 |
titleOfInvention |
Photoresist trimming process |
abstract |
A photoresist trimming gas compound is provided which will selectively remove a resist foot or scum from the lower portions of sidewalls of a photoresist. Additionally, the trimmer compound hardens or toughens an upper surface of the photoresist thereby strengthening the photoresist. The trimmer compound includes O 2 and at least one other gaseous oxide and is typically utilized in a dry etching process after a trench has been formed in a photoresist The other oxide gases, in addition to the O 2 may include CO 2 , SO 2 and NO 2 . |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9337093-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7955988-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012015517-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008020586-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7960288-B2 |
priorityDate |
2004-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |