http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7300855-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36f8253f3d0d59bcd9259217d4385d10 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3185 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76224 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-76 |
| filingDate | 2005-11-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5599206586540cc11363880152577bf |
| publicationDate | 2007-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-7300855-B2 |
| titleOfInvention | Reversible oxidation protection of microcomponents |
| abstract | In a method for the reversible oxidation protection of microcomponents, a substrate is provided, a silicon nitride layer is provided on the substrate in order to protect it against oxidation, an insulation layer is applied to the silicon nitride layer, and a reoxidation process is carried out. In the reoxidation process are generated oxygen radicals which are passed through the insulation layer to the silicon nitride layer in order to convert silicon nitride of the nitride layer into silicon dioxide. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015140819-A1 |
| priorityDate | 2004-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.