| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2c78d80e9d323ad7c79518c80e0b8d16 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02046 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02063
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76897 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-4763 |
| filingDate |
2004-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2007-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aaf8194cfefd82a1a2ae8791f513a3ca |
| publicationDate |
2007-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-7291550-B2 |
| titleOfInvention |
Method to form a contact hole |
| abstract |
A example method of forming of a contact hole by removing residue and oxide spacer beside a nitride spacer after a CF containing etch. We provide a gate structure with nitride spacers on the sidewalls of the gate. We provide a dielectric layer (oxide) over the substrate and gate structure. We form a contact photoresist pattern over the oxide dielectric layer. We etch the oxide dielectric layer using fluorocarbons (CxFy) to form contact openings and residual spacer. The photoresist is striped. Preferably, a NF 3 and N 2 and H 2 plasma treatment is performed to deposit a byproducts layer over the residual spacer. The byproducts layer and residual spacer are removed preferably using one of the following processes: (1) heat (2) DI rinse or (3) IR or UV radiation. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9887160-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011237080-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8906194-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9017933-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9761583-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8519482-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7682986-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013334616-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013075823-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010132889-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009087978-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9831182-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008188081-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8916939-B2 |
| priorityDate |
2004-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |