http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7276263-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ca281a36dc88c033ae84728f46ecd5a3 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-479 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C2217-445 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C17-3417 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03C1-008 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D5-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C17-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03C1-00 |
| filingDate | 2005-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a2b881529ffd4091ca4a6a04a1c6f6c8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ffa66e76b2cc3c992fc551460a2eba3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee94ba0eee473f54e5388597674fd486 |
| publicationDate | 2007-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-7276263-B2 |
| titleOfInvention | Process for producing low reflection glass plate, and low reflection glass plate |
| abstract | The present invention provides a low reflection glass plate which has an effect of reducing reflectance against light even at an incident angle of 60° sufficiently, in high yield. A process for producing a low reflection glass plate, characterized by the use of a treating fluid (1) comprising a resin B1, fine gold particles, an organic metal compound of at least one metal (M1) selected from the group consisting of iron, titanium and zirconium, and an organic solvent, and a treating fluid (2) comprising a film-forming compound, a resin B2 having the same thermal decomposition temperature as the resin B1 or a higher thermal decomposition temperature than the resin B1, wherein said process comprises applying the treating fluid (1) on the surface of a transparent glass substrate, followed by drying at a temperature of from 50 to 250° C. to remove the organic solvent, further applying the treating fluid (2), followed by drying at from 50 to 250° C. to remove the organic solvent, and then baking the treated transparent glass substrate at a temperature of from 400 to 800° C. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016159282-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10358087-B2 |
| priorityDate | 2003-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 43.