Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_496e3f7537b43a3a3ecb2dbe8b7774a8 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-509 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45502 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45578 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-509 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
filingDate |
2003-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2007-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70608e4b48523593b2f212c97fcb0eab http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6dee72a0f1faf251ad1ad1d3f12a4cac http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e36f3ae8bef3c7685375ee82c669eaaf |
publicationDate |
2007-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7264849-B2 |
titleOfInvention |
Roll-vortex plasma chemical vapor deposition method |
abstract |
A chemical vapor deposition method includes a step of maintaining a hydrogen plasma at low pressure in a processing chamber. The processing chamber has a long, wide, thin geometry to favor deposition of thin-film silicon on sheet substrates over the chamber walls. The sheet substrates are moved through between ends. A pair of opposing radio frequency electrodes above and below the workpieces are electrically driven hard to generate a flat, pancaked plasma cloud in the middle spaces of the processing chamber. A collinear series of gas injector jets pointed slightly up on a silane-jet manifold introduce 100% silane gas at high velocity from the side in order to roll the plasma cloud in a coaxial vortex. A second such silane-jet manifold is placed on the opposite side and pointed slightly down to further help roll the plasma and maintain a narrow band of silane concentration. A silane-concentration monitor observes the relative amplitudes of the spectral signatures of the silane and the hydrogen constituents in the roll-vortex plasma and outputs a process control feedback signal that is used to keep the silane in hydrogen concentration at about 6-7%. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8771499-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9443702-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107078049-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011006040-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10526708-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10537840-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9611556-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9359674-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009238972-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009120686-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009082517-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9299956-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10049859-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9096932-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9096933-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8697197-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009004363-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008139003-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011005681-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8268136-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011005682-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009017206-A1 |
priorityDate |
2003-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |