http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7224450-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-93 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-278 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9501 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-274 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-27 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-95 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-01 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B25J1-00 |
| filingDate | 2006-02-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac22aad14fbd846974ed4b51d569aeac http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0672429a76b9ae3e03cce622123287a7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca1826c4cecaabd50ffc26c87970b378 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b09e986bacf7d625e12a49ec5bd2e0b5 |
| publicationDate | 2007-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-7224450-B2 |
| titleOfInvention | Method and apparatus for position-dependent optical metrology calibration |
| abstract | A calibration method suitable for highly precise and highly accurate surface metrology measurements is described. In preferred embodiments, an optical inspection tool including a movable optics system is characterized in terms of position and wavelength dependent quantities over a range of motion. Once the position-dependant quantities are determined at various wavelengths and positions, they are stored and used to interpret data from test wafers having an unknown metrology. Free of position-dependent variations and other information pertaining to the measurement system, the accuracy of the resulting wafer measurement more closely matches the precision of the tool than existing techniques. In particular embodiments, a portion of the characterization of the optical system is accomplished by using tilted black glass to provide a non-reflective reference. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9524058-B2 |
| priorityDate | 2001-12-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 36.