Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05B6-6414 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-032 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
filingDate |
2004-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2007-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4851e387714421b7078086c4076be866 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fda7be584c5a6af07c427bf31a3b0686 |
publicationDate |
2007-03-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7195855-B2 |
titleOfInvention |
Negative-type photosensitive resin composition containing epoxy compound |
abstract |
A negative-type photosensitive resin compositions containing an epoxy compound are provided. These compositions use poly(p-vinylphenol) as the base resin and have good development performance when using an aqueous developer, such as tetramethylammonium hydroxide solution. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10705424-B2 |
priorityDate |
2003-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |