Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
filingDate |
2004-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2007-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6dcaf2e41aae10e9b79738c410a8afc8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc396555fddda634d3b611c26022cda0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3a63ff0cf1f0fb761f1fa811fc43fa7 |
publicationDate |
2007-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7183036-B2 |
titleOfInvention |
Low activation energy positive resist |
abstract |
Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation (and possibly other radiation) at low energy levels are obtained using a polymer having acrylate/methacrylate monomeric units comprising a low activation energy moiety preferably attached to a naphthalene ester group. The resist allows the performance benefit of acrylate/methacrylate polymers with low activation energy for imaging thereby enabling improved resolution and reduced post-exposure bake sensitivity. The resist polymer also preferably contains monomeric units comprising fluoroalcohol moiety and a monomeric units comprising a lactone moiety. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007117040-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009004596-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009286180-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7566527-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005266343-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8029975-B2 |
priorityDate |
2004-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |