http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7176337-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d5d04736b0b882a4f5a1e0e0e4cd8cbb |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23G5-02803 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C17-21 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C17-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C17-10 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23G5-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C17-21 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C17-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C19-08 |
| filingDate | 2004-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2007-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c0bff64fecb06862f02e3823233cda40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e0f6b7d3cb8d2da2b25c200cb00c8a67 |
| publicationDate | 2007-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-7176337-B2 |
| titleOfInvention | Process for producing perfluorocarbons and use thereof |
| abstract | The process for producing perfluorocarbons according to the present invention is characterized in that in the production of a perfluorocarbon by contacting an organic compound with a fluorine gas, the organic compound is contacted with the fluorine gas at a temperature of from 200 to 500° C. and the content of an oxygen gas within the reaction system is controlled to 2% by volume or less based on the gas components in the reaction starting material, whereby a perfluorocarbon reduced in the content of impurities is produced. According to the process for producing perfluorocarbons of the present invention, high-purity perfluorocarbons extremely suppressed in the production of impurities such as an oxygen-containing compound can be obtained. The perfluorocarbons obtained by the production process of the present invention contain substantially no oxygen-containing compound and, therefore, can be effectively used as an etching or cleaning gas for use in a process for producing a semiconductor device. |
| priorityDate | 2001-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 64.