http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7172977-B1

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a0f26a9c2efad3ae086a108f3c04b57d
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0209
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
filingDate 2004-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2007-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a68a40bbf9d0763ebe7f7bba56488d02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f229652e2b3d474582e05117750503d1
publicationDate 2007-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7172977-B1
titleOfInvention Method for non-destructive removal of cured epoxy from wafer backside
abstract Disclosed is a method for non-destructive removal of cured epoxy from a wafer backside. A wafer back-coated with epoxy is soaked in an acetone bath for a period of time, allowing degradation of the epoxy coating adhesion strength. The epoxy coating is then peeled or scraped away, leaving the wafer backside ready for a rework or for a reapplication of a new epoxy coating.
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priorityDate 2004-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 25.