Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_730848fc69ca7afca2b3c3e10b6cfd92 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-117 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 |
filingDate |
2003-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2006-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63e8bda467490ddd0f9362abbc3b5250 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9cfa284e07dda337bb27125e4456ad94 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_add23135f1e5cfd4c9f0de95dc3cb70f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfe25c9354f65b1f094b68db2fc948b4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b31e13e6b990a432c2d7f6a4275b5aa |
publicationDate |
2006-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7078157-B2 |
titleOfInvention |
Photosensitive composition and use thereof |
abstract |
A composition that comprises a photopolymerizable compound containing at least two pendant unsaturated groups; at least one ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic monomer; at least one nonionic surfactant; and at least one photoinitiator is provided. The composition also preferably contains at least one amine modified acrylic oligomer and a dye. Other conventional photoresist components such as photosensitizers, adhesion promoters, leveling agents and solvents may also be included in the composition. Such compositions are useful for forming a pattern on a substrate, such as patterning microlithographic circuits on a substrate. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012015857-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012097059-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10752718-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013064890-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018215850-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9074169-B2 |
priorityDate |
2003-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |