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publicationDate 2006-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7034399-B2
titleOfInvention Forming a porous dielectric layer
abstract A dielectric layer is made porous by treating the dielectric material after metal interconnects are formed in or through that layer. The porosity lowers the dielectric constant of the dielectric material. The dielectric material may be subjected to an electron beam or a sonication bath to create the pores. The structure has smooth sidewalls for metal interconnects extending through the dielectric layer.
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