patent/US-7029803-B2

http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7029803-B2

Outgoing Links

Predicate	Object
assignee	http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947
classificationCPCInventive	http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3442
classificationIPCInventive	http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01F9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-46
filingDate	2003-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate	2006-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor	http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9eb47bd45ac28a456e213075adf83d0a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_036b67041775b2d263119b97177ebdbf http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da67d14221696e6b1652e5d6b584055b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d92861599e6ee980b94a9a8bff57e623 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_124b4c37fc66644c8f34dd4f8ab9559a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a5580fb98b034fe7adf97c0feb34a8b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cf69acf286d20269ae24388a10243edd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7d3a3b96b0b3ace0a2ae408a8608d57
publicationDate	2006-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber	US-7029803-B2
titleOfInvention	Attenuating phase shift mask blank and photomask
abstract	The present invention relates to attenuating phase shift mask blanks for use in lithography, a method of fabricating such a mask blank.
isCitedBy	http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11624115-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006008749-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9937099-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9458536-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11077233-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10016338-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007224840-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10363370-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10390744-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9903782-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10537273-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11123491-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009311612-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9664626-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11298293-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11116695-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9662450-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9846358-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11148856-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8512796-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11406765-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8834954-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9863042-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11724860-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9764093-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10537494-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7968255-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11684546-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11344473-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005260504-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10189603-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9545360-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10338464-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9878101-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9272095-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9572526-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10577154-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10201660-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11066745-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9554968-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10912714-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016291459-A1
priorityDate	2003-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type	http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate	Subject
isCitedBy	http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6274280-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5477058-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5939225-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0468352-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5635315-A
isDiscussedBy	http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23991 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419569950

Total number of triples: 79.