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filingDate 2002-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2006-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e081ab555664d591070c9d9d6722a17
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publicationDate 2006-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7028399-B2
titleOfInvention Wiring process
abstract The present invention provides a process for wiring electrical contact sites, in particular on the surface of an electronic or microelectronic component, with the following steps: applying and patterning at least one dielectric on the component surface; currentlessly depositing a conductor starting layer for producing metal wiring interconnects and substitute contact sites with short-circuit contacts for interconnecting the individual metal wiring interconnects and the corresponding electrical contact sites; reinforcing the conductor starting layer by a common electrodepositing process; and separating the short-circuit contacts for separating the electrical contact sites or the contact sites of the wiring from one another.
priorityDate 2001-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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