Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36f8253f3d0d59bcd9259217d4385d10 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-182 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49156 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49155 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49147 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-49128 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0052 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-175 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-4846 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-242 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-48 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-24 |
filingDate |
2002-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2006-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e081ab555664d591070c9d9d6722a17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74ce767632953a29117a592b955930c8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb51ecc6250cd828e37570304f15e190 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_944295cfe1466dc7a3c9724ef71cff3f |
publicationDate |
2006-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7028399-B2 |
titleOfInvention |
Wiring process |
abstract |
The present invention provides a process for wiring electrical contact sites, in particular on the surface of an electronic or microelectronic component, with the following steps: applying and patterning at least one dielectric on the component surface; currentlessly depositing a conductor starting layer for producing metal wiring interconnects and substitute contact sites with short-circuit contacts for interconnecting the individual metal wiring interconnects and the corresponding electrical contact sites; reinforcing the conductor starting layer by a common electrodepositing process; and separating the short-circuit contacts for separating the electrical contact sites or the contact sites of the wiring from one another. |
priorityDate |
2001-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |