| abstract |
Photoresist polymers and photoresist compositions are disclosed. A photoresist polymer represented by Formula 1 and a photoresist composition containing the same have excellent etching resistance, thermal resistance and adhesive property, and high affinity to an developing solution, thereby improving LER (line edge roughness). n wherein X 1 , X 2 , X 3 , R 1 , R 2 , R 3 , R 4 , R 5 , m, n, o, a, b, c, d and e are as defined in the description. |