Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-73 |
filingDate |
2002-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2006-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0da5708bb45d88b87a655a2817fdc610 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a181d656a00f0be4a0849d92f21648d |
publicationDate |
2006-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-7022455-B2 |
titleOfInvention |
Photoacid-labile polymers and photoresists comprising same |
abstract |
The present invention relates to new polymers that contain photoacid-labile groups that comprise arylalkyl groups. Particularly preferred are polymers having a benzylic carbon directly linked to an ester oxygen. Polymers of the invention are useful as a component of chemically-amplified positive-acting resists. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9206276-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9182669-B2 |
priorityDate |
2001-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |