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filingDate 2004-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2006-03-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-7015567-B2
titleOfInvention Method for fabricating a semiconductor structure using a protective layer, and semiconductor structure
abstract A method produces a semiconductor structure on a substrate. Then, a protective layer is applied to the semiconductor structure. To fabricate a further semiconductor structure that is to be formed on the substrate, intermediate processes, which lead to the formation of cracks in the protective layer, are carried out. The protective layer is repaired with the aid of a repair layer.
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