| abstract |
A composition for removing resist, polymeric material and/or etching residue from a substrate comprising titanium or an alloy thereof, the composition comprising hydroxylamine or a derivative thereof and at least one compound having the general formula (I) wherein: R 1 and R 3 are each independently selected from H, OH, CO 2 H, halogen, C 1 –C 3 alkyl, C 1 –C 3 alkoxy or (CH 2 ) n OH wherein n is 1, 2 or 3; and R 2 is selected from C 9 –C 16 alkyl, or C 9 –C 16 alkoxy |