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filingDate 2001-03-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2006-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2006-02-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6998636-B2
titleOfInvention Materials having low dielectric constants and method of making
abstract The invention relates to a material including carbon, oxygen, silicon and hydrogen and having a dielectric constant of from about 2.1 to about 3.0 where an FTIR scan of the material includes at least two major peaks signifying Si—CH 3 bonding. The invention further relates to a material which has a variable dielectric constant through the thickness of the material. Another aspect of the invention is the method of making the material.
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