| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e757fd4fedc4fe825bb81b1b466a0947 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-76
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-73
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2004-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2006-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ac2cf8b364240084d8f595c2b2d0fef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d7c9f34de12969c5f3eca8e5864a066f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_88ee237348ddf794ea55454180289a13 |
| publicationDate |
2006-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6991890-B2 |
| titleOfInvention |
Negative photoresist composition involving non-crosslinking chemistry |
| abstract |
A negative photoresist composition and a method of patterning a substrate through use of the negative photoresist composition. The composition includes: a radiation sensitive acid generator; an additive; and a resist polymer derived from at least one first monomer including a hydroxy group. The first monomer may be acidic or approximately pH neutral. The resist polymer may be further derived from a second monomer having an aqueous base soluble moiety. The additive may include one or more alicyclic structures. The acid generator is adapted to generate an acid upon exposure to radiation. The resist polymer is adapted to chemically react with the additive in the presence of the acid to generate a non-crosslinking reaction product that is insoluble in an aqueous alkaline developer solution. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7781142-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010266953-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009174099-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008038661-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7794646-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8580482-B2 |
| priorityDate |
2004-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |