| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3c19b4f78ee3dc548dbdc3762f03d217 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05G2-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05G2-008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05G2-006 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05G2-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G21K5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G21K5-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G21K5-08 |
| filingDate |
2001-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2005-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2dfa74f504a2867b1ad7b3afbaa613f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1486cba8a5c3cfefd2f71c5b1a1cc570
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_591cb32acee321b8bfb7421b1d396312
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af0d8f48893f5218bf7eb2ac2345e509 |
| publicationDate |
2005-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6956885-B2 |
| titleOfInvention |
Electromagnetic radiation generation using a laser produced plasma |
| abstract |
An extreme ultraviolet radiation generator is disclosed in which Xenon gas is continuously ejected from a high pressure nozzle into a low pressure chamber to generate Xenon atom clusters which are irradiated with a high repetition rate pulsed laser to form a plasma and yield quasi-continuous EUV generation. The nozzle has a beveled outer rim to enable the focus point of the laser light to be brought close to the nozzle. The nozzle is cooled to a temperature at which background Xenon gas condenses onto the nozzle forming a protective layer. A gas compressor serves to recirculate the Xenon gas and batch purification triggered by a mass spectrometer monitoring gas purity may be periodically applied. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9609732-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008020083-A1 |
| priorityDate |
2000-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |