| abstract |
A pattern can be precisely formed by irradiating, with an active energy beam, a positive sensitive resin composition according to this invention comprising a base polymer, an ether-bond-containing olefinic unsaturated compound and an acid-generating agent, where the base polymer is a copolymer comprising the structural units represented by formulas (1) to (3): n n n where R 1 and R 3 are each independently hydrogen or methyl and R 2 is C 1 -C 6 straight or branched unsubstituted alkyl or C 1 -C 6 straight or branched substituted alkyl, n wherein a, b and c are 0.05 to 0.7, 0.15 to 0.8 and 0.01 to 0.5, respectively and a+b+c=1. |