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publicationDate 2005-09-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6943451-B2
titleOfInvention Semiconductor devices containing a discontinuous cap layer and methods for forming same
abstract Novel semiconductor devices containing a discontinuous cap layer and possessing a relatively low dielectric constant are provide herein. The novel semiconductor devices includes at least a substrate, a first dielectric layer applied on at least a portion of the substrate, a first set of openings formed through the dielectric layer to expose the surface of the substrate so that a conductive material deposited within and filling the openings provides a first set of electrical contact conductive elements and a discontinuous layer of cap material covering at least the top of the conductive elements to provide a first set of discontinuous cap elements. Methods for forming the semiconductor devices are also provided.
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