| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2002-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2005-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a10c67e06d16a8a91166f5c4d8b10580
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc6a19055ab71bfe7066169b927fae8b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a28a512426e9580683736d2c5420675 |
| publicationDate |
2005-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6927266-B2 |
| titleOfInvention |
Bottom anti-reflective coat forming composition for lithography |
| abstract |
The present invention relates to a bottom anti-reflective coat forming composition having the resin with the structural unit comprising maleimide or maleimide derivative for the lithography process in the preparation of semiconductor device. The resin comprises maleimide or derivative thereof in the principal chain or the side chain and its weight-average molecular weight is 700-1000000. The invention offers the bottom anti-reflective coating for lithography showing high anti-reflective effect, no intermixing with resist layer, excellent resist pattern, and large dry etching rate in comparison to resist. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7365408-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009035704-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8039201-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8697336-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009130591-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003203645-A1 |
| priorityDate |
2001-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |