| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_709b4a26ef028713f9b302509eb824d7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2059
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-143 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61N5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G21G5-00 |
| filingDate |
2002-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2005-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd73b8f93f64631662177ff00dc2b94f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a9172a242b9e2eb58f1af863a159e66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5d3f2fcaa926aea71e49534e98c0520a |
| publicationDate |
2005-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6919164-B2 |
| titleOfInvention |
Patterning compositions using E-beam lithography and structures and devices made thereby |
| abstract |
A method of patterning a layer of e-beam sensitive dielectric material, such as bisbenzocyclobutene monomers, using electron beam lithography. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7557448-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008136035-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7262075-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005191842-A1 |
| priorityDate |
2001-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |