| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76871
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate |
2003-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2005-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d52f0b765373c2787a7d6ee5a078eed3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5bb3fe83eef9aeb97e87a8d7e3ef3c29
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2b2eb996cf4a6af128add2feac4b0c8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ecbd7fa115f0f892a4ab6782a2735208
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b9896865da71f8785eed4de02f0ef09a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1013c6bf5629de2076b0ea59b0b65d3d |
| publicationDate |
2005-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6905960-B2 |
| titleOfInvention |
Method of forming a contact in a semiconductor device |
| abstract |
In a method of forming a contact in a semiconductor device, an insulating layer is formed on the semiconductor substrate. Then, a contact hole is formed by selectively etching the insulating layer. A barrier metal layer is deposited on side and bottom surfaces of the contact hole and on a top surface of the insulating layer to a uniform thickness. A wetting layer of an oxidation-resistive metal material is deposited on the barrier metal layer. A metal layer is formed on the wetting layer and fills the contact hole to thereby form a contact in the semiconductor device. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10211101-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8365949-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10217664-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018138125-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010089940-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9960078-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10192826-B2 |
| priorityDate |
2002-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |