Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
filingDate |
2003-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2005-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_795ad0d1b3ae60e82e32666e51205652 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_855a9d5a5210fe57ed90fe22ef5ecc27 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5ea36917b5b1586ed52df23c8adf439 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a947143e2a51fad824f9494f70ea7f6d |
publicationDate |
2005-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-6900003-B2 |
titleOfInvention |
Photoresist processing aid and method |
abstract |
A composition and method to reduce photolithographic residue and scum formation on a substrate or in a solution, and to reduce or prevent foam formation. The composition contains a diphenyl oxide compound in combination with an antifoam agent. The composition may be added to developer solutions and stripper solutions used in manufacturing printed wiring boards. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7846640-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007184388-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8795949-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009130581-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004185371-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012156879-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006154158-A1 |
priorityDate |
2002-04-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |