abstract |
Epoxy compounds of formula (1) are provided wherein W is CH 2 , O or S, X and Y are —CR 1 R 2 — or —C(═O)—, k is 0 or 1, R 1 and R 2 are H or alkyl, or R 1 and R 2 , taken together, may form an aliphatic hydrocarbon ring with the carbon atom to which they are connected. A resist composition comprising a polymer having recurring units of the epoxy compound as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV. |