| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-114
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F216-165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F232-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F222-06 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F216-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F222-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F232-08 |
| filingDate |
2003-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2005-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1df85eaaecb43cea07de301f902d62d2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2f19b611fef8c830266c1089c37fcf7a |
| publicationDate |
2005-05-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6897005-B2 |
| titleOfInvention |
Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same |
| abstract |
There are provided a photosensitive polymer having a copolymer of alkyl vinyl ether and a resist composition containing the same. The photosensitive polymer includes a copolymer of alkyl vinyl ether and maleic anhydride, represented by the following structure: n n nwherein X is one of a linear alkyl vinyl ether and a cyclic alkyl vinyl ether, which are respectively represented by the structures n n nwherein y is one of the integer values 1 through 4, R 1 is one of a hydrogen atom and a methyl group, R 2 is a C 1 to C 20 hydrocarbon, and R 3 is one of a hydrogen atom, a C 1 to C 3 alkyl group and an alkoxy group. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005186505-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7273690-B2 |
| priorityDate |
2000-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |