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filingDate 2003-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2005-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2005-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6890813-B2
titleOfInvention Polymer film metalization
abstract Embodiments in accordance with the present invention eliminate the need for a subtractive metal patterning process to pattern the electrode above a ferroelectric polymer. Instead, a selective electroless deposition process is used. A conductive polymer is used as a seed layer for the electroless plating of the metal electrode. A cost saving is provided by eliminating the chemical costs associated with conventional resist removal processing. The methods also potentially eliminate the requirement for aggressive and environmentally unsafe chemical-based photoresist removal processes.
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