Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36f8253f3d0d59bcd9259217d4385d10 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0387 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate |
2002-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2005-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74ce767632953a29117a592b955930c8 |
publicationDate |
2005-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-6884567-B2 |
titleOfInvention |
Photosensitive formulation for buffer coatings, film containing the photosensitive formulation, and method for fabricating electronics with the photosensitive formulation |
abstract |
A photosensitive formulation for high-temperature-resistant photoresists is based on polyhydroxyamides. The photosensitive formulations display a much higher photosensitivity than the comparable formulations based on quinone azide photoactive components. After conversion to the polybenzoxazole, the novel formulations also display a lower dielectric constant than the quinone azide-based formulations. A film can be made by applying the photosensitive formulation to a wafer and then evaporating the solvent. A method for fabricating electronics and micorelectronics structures a wafer by using the film in photolithography. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010159217-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009267224-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010092879-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8871422-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8420291-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011171436-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7855445-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8298747-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010258336-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8758977-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009181224-A1 |
priorityDate |
2001-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |