| abstract |
A chemically amplified resist composition comprising (A) a polymer comprising recurring units containing at least one fluorine atom, (B) a compound of formula (1) wherein R 1 and R 2 are H, F or alkyl or fluorinated alkyl, at least one of R 1 and R 2 contains at least one fluorine atom, R 3 is a single bond or alkylene, R 4 is a n-valent aromatic or cyclic diene group, R 5 is H or C(═O)R 6 , R 6 is H or methyl, and n is 2, 3 or 4, (C) an organic solvent, and (D) a photoacid generator is sensitive to high-energy radiation and has improved sensitivity and transparency at a wavelength of less than 200 nm. |