| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1e70c0aeade92d7571d955d3b90ea06e |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B6-02033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B6-02152
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B2006-1219
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B6-02138 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B6-138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B6-124
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B6-1221 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-124
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B6-138
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-18 |
| filingDate |
2001-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2005-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e16c280c740b705b8fd5e7a12c20a445 |
| publicationDate |
2005-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6842544-B2 |
| titleOfInvention |
Method for apodizing a planar waveguide grating |
| abstract |
A method for making an apodized Bragg grating in a photosensitive, planar, linear waveguide. A photosensitive, planar, linear waveguide is provided on a surface of a substrate. A patterned phase mask is placed between the waveguide and a laser beam. The waveguide is exposed through the phase mask to the laser beam wherein either the laser beam is moving at a substantially constant velocity with respect to the substrate and phase mask, or the substrate and phase mask are moving at a substantially constant velocity with respect to the laser beam. The beam has a smoothly varying intensity profile, and the exposure is conducted at an angle of more than 0° and less than 90° to the longitudinal axis of the waveguide under conditions sufficient to induce a modulation in the index of refraction of the waveguide and impart an apodized Bragg grating in the waveguide corresponding to the phase mask pattern. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003016912-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006029330-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007047887-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7649615-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8509582-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7181107-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020369563-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8923102-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7024075-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9286920-B1 |
| priorityDate |
2001-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |