| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F232-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2012
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F234-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F234-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2002-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2005-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0da5708bb45d88b87a655a2817fdc610
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_acec63f031dfc974c27c63be809ec966
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8cb63eea1e90ac8496e2b30e8350872
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f33c7a0d5428cba3ecb7e4a5f532327b |
| publicationDate |
2005-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6841331-B2 |
| titleOfInvention |
Polymers, processes for polymer synthesis and photoresist compositions |
| abstract |
The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8163852-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7208261-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8759462-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009123868-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7273690-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9733564-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013224654-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005186505-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005287474-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004259025-A1 |
| priorityDate |
2001-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |