| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76232
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-308
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-762 |
| filingDate |
2003-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2004-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c632621f6322c4f2b762899ada6da37d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ceaff3aab2c662cc1dcabe6dfe116a28 |
| publicationDate |
2004-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6828248-B1 |
| titleOfInvention |
Method of pull back for forming shallow trench isolation |
| abstract |
A method of pull back for a shallow trench isolation (STI) structure is provided. The method firstly provides a substrate having a hard mask layer disposed thereupon and a dielectric layer above the hard mask layer. Then a trench is formed within the hard mask layer, the dielectric layer and the substrate. Finally, the hard mask layer and the dielectric layer are pulled back by using a halogen containing etching process. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11699594-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7858488-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6897122-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9224606-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010193879-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7759214-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008160715-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7061075-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007042564-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9673082-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I570837-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10062656-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10269616-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-101783313-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9012296-B2 |
| priorityDate |
2003-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |