http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6811931-B1

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filingDate 1999-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2004-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f101414ae80ebc355092e6ea5d73ab1
publicationDate 2004-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6811931-B1
titleOfInvention Photomask original form having layer for protecting film surface and method for preparing the same, and protective layer-forming liquid for photomask original form
abstract A photomask plate with a film surface protective layer is characterized in that a protective layer forming solution is prepared by mixing a main constituent comprising a two-liquid cross-linked antifouling surface coating agent, prepared by combining a mixed resin of a fluororesin and an acrylic resin in a solvent mixture of n-butyl acetate, methyl ethyl ketone (MEK) and methyl isobutyl ketone (MIBK), with a cross-linking curing agent, prepared by mixing a polyisocyanate prepolymer and ethyl acetate, and a diluent comprising n-butyl acetate, methyl ethyl ketone (MEK) and cellosolve (ethylene glycol monoethyl ether) acetate. This protective layer forming solution is applied to a film surface of a photomask plate photosensitive emulsion layer produced by forming the film surface of the photosensitive emulsion layer (an emulsion photomask) on a substrate. The protective layer forming solution is then aged to form a film surface protective layer in a laminated manner. The resulting inexpensive and durable photomask is protected from being soiled or marked while having minimal reduction in ultraviolet light transmittance.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10584264-B1
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011027702-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8663874-B2
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Total number of triples: 39.