| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0915a20751d3fd0297df7ac494688272 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C7-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-143 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C5-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-093
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C7-04 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate |
2003-04-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2004-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93075f85b81e6e4ca145f1c26a85077e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b23b5eb31642274558ef5a0b7973fe5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d78f81551fadd440e03b5f1cca9d08d4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2838408283cbbe25713c650f54b723d7 |
| publicationDate |
2004-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6773865-B2 |
| titleOfInvention |
Anti-charging layer for beam lithography and mask fabrication |
| abstract |
This invention discloses an anti-charging layer for beam lithography and mask fabrication. This invention reduces beam displacement and increases pattern placement accuracy. The process will be used in the beam fabrication of high-resolution lithographic masks as well as beam direct write lithography of electronic devices. The anti-charging layer is formed by the use of metal films bound to metal ligating self-assembled monolayers (SAMs) as discharge layers. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9881785-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2012148571-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2506036-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009258303-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7901848-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005157283-A1 |
| priorityDate |
2001-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |