Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5ddadb999be4f451dfc44d8e359d8f6a |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-12 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-65 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C309-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D333-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-66 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-65 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-46 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D333-22 |
filingDate |
2003-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2004-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5b4b6794e2b3e6e912e50aea605ef4c2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_693c423bc071c58eb1f49f4d278a832c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad121e2dc3047f6d5102e3c4b452b71d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e6fefe696c0cb8d022242f938238a45 |
publicationDate |
2004-08-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-6770420-B2 |
titleOfInvention |
Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity |
abstract |
The invention describes the use of oxime alkyl sulfonate compounds of formula 1R0 is either an R1-X group or R2;X is a direct bond, an oxygen atom or a sulfur atom;R1 is hydrogen, C1-C4alkyl or a phenyl group which is unsubstituted or substituted by a substituent selected from the group consisting of chloro, bromo, C1-C4alkyl and C1-C4-alkyloxy;R2 is hydrogen or C1-C4alkyl; andR3 is straight-chain or branched C1-C12alkyl which is unsubstituted or substituted by one or more than one halogen atom;as photosensitive add generator in a chemically amplified photoresist which is developable in alkaline medium and which is sensitive to radiation at a wavelength of 340 to 390 nanometers and correspondingly composed positive and negative photoresists for the above-mentioned wavelength range. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006068325-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8975001-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8980536-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7244544-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004263811-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10221193-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7068349-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7026094-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013105297-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8778601-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10919909-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011159253-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004209186-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006141693-A1 |
priorityDate |
1996-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |