| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76832 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76808 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 |
| filingDate |
2002-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2004-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7eb213879a3d808876e13769e95d55d7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba7ae19d2ad01cae6c6141d4c9501aae |
| publicationDate |
2004-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6767833-B2 |
| titleOfInvention |
Method for damascene reworking |
| abstract |
A method for avoiding processing damage to an anisotropically etched damascene feature in a reworking process including providing a first photoresist layer over a first anisotropically etched opening the first photoresist layer photolithographically patterned for forming a second anisotropically etched opening overlying the first anisotropically etched opening; blanket depositing a flowable resinous polymeric material to form a resinous layer over the first photoresist layer in a reworking process to include filling a remaining portion of the first anisotropically etched opening; removing the resinous layer and the first photoresist layer in a planarizing process to reveal an upper substrate surface; and, depositing a second photoresist layer over the upper substrate surface for photolithographic patterning of the second anisotropically etched opening overlying the first anisotropically etched opening in the reworking process. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009111268-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010190272-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016236930-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7749904-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10242872-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-RE41697-E
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-100375249-C
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006110941-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6872663-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8222143-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007212877-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7226873-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9708183-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10329146-B2 |
| priorityDate |
2002-07-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |