| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J2333-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-1173
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-31536 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J7-123
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-167
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03G5-0525
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-185
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03G5-0578 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J7-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D4-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-461
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G5-05
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-822 |
| filingDate |
2002-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2004-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_421a0d73134b370f04687238dd708a24 |
| publicationDate |
2004-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6764812-B1 |
| titleOfInvention |
Plasma deposited selective wetting material |
| abstract |
A selective wetting material is formed by plasma depositing a film on a substrate from a two-component reaction of a silicon donor and organic precursor, and photo-oxidizing selected regions of the deposited film to form wetting regions to which a liquid will selectively adhere. When the liquid is an electrically conductive material, the process may be used to form printed circuits on a circuit board. When the substrate is optically transparent and the non-photo-oxidized regions of the film are removed, the process may be used to form a photomask. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005043186-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10930516-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008114116-A1 |
| priorityDate |
1996-06-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |