| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3a62c92e56568bd104089aac22ca487b |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-7045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate |
2002-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2004-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aaa26d7284c6169b88584ed1bfc96db3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2bd2196f749d1d2d67525fa4e0b11211 |
| publicationDate |
2004-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6764808-B2 |
| titleOfInvention |
Self-aligned pattern formation using wavelenghts |
| abstract |
An integrated circuit fabrication process for patterning features at sub-lithographic dimensions is disclosed herein. The process includes sequentially exposing a of a film of arylalkoxysilane with a photobase generator, and catalytic amount of water coated on top of a conventional lipophilic photoresist layer provided over a substrate and exposed to a radiation at a first and a second lithographic wavelengths. The first lithographic wavelength is shorter than the second lithographic wavelength. Exposure to the first lithographic wavelength causes a self-aligned mask to form within the photoresist layer. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007241329-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7501230-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011163446-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008122106-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7229723-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004197676-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009076291-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7611828-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8278760-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7863150-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004086800-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7816072-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009068594-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006101513-A1 |
| priorityDate |
2002-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |