http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6749990-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-108 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 2002-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2004-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec72e12d4077c325ad02dc88ccb08bb3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_48e6069d2ef2b0ddee606e80d42f689c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60ea28a01d4e427f5610acd2c434d8f1 |
| publicationDate | 2004-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-6749990-B2 |
| titleOfInvention | Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same |
| abstract | A chemical amplification photoresist monomer, a photoresist polymer prepared thereof, and a photoresist composition using the polymer. More specifically, a chemical amplification photoresist polymer comprising a fluorine-containing monomer represented by Chemical Formula 1, and a composition comprising the polymer.The photoresist composition has excellent etching resistance, heat resistance and adhesiveness, and is developable in aqueous tetramethylammonium hydroxide (TMAH) solution. As the composition has low light absorbance at 193 nm and 157 nm wavelength, it is very useful for forming ultramicro pattern in the process using a light source of far ultraviolet, especially of VUV (157 nm).In the Formula, R1, R2, R3 and R4 is defined in the specification. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007224551-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009130850-A1 |
| priorityDate | 2001-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 155.