Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_27562ace359200dce7274340b5c7c28b |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N2021-95676 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-95607 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-84 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-896 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-956 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
filingDate |
2002-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2004-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d84bd9cb8ca49c772fb04de25b3913d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1497411e371ba7e218e7416c194260f1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5da015bef13959b1f1f3e636ff0c988 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4e8795f5951d06a9d07e315325ada121 |
publicationDate |
2004-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-6727512-B2 |
titleOfInvention |
Method and system for detecting phase defects in lithographic masks and semiconductor wafers |
abstract |
Provided are apparatus and methods for detecting phase defects. The invention relies generally on the distortion of light as it passes through defects in phase shift masks to detect these defects. Light traveling through a defect, such as a bump in an etched area will travel at a different angle than light traveling through air. In order to enhance the signals generated from the defects, the invention in several embodiments provides a multiple element detector having at least four elements, arranged in a radially symmetric configuration. Individual elements of the detector are selected to form a differential signal based on the configuration of pattern lines in the area proximate to the defect. The resulting differential signal is used to generate an image signal and to identify phase defects. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7583376-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004052411-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7788629-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7043071-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006066844-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006036979-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102804063-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-102804063-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11204332-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7423745-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I607213-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011239167-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9367911-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101422256-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007070338-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7911624-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10648925-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011181868-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8711346-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10151706-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7564545-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008226157-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9448343-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8108805-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008231862-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013336573-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10634623-B2 |
priorityDate |
2002-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |