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filingDate 2002-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2004-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2004-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-6723209-B2
titleOfInvention System and method for performing thin film deposition or chemical treatment using an energetic flux of neutral reactive molecular fragments, atoms or radicals
abstract A system and method for forming a chemically reacted layer proximate an exposed surface of a substrate is disclosed. A gas supply provides a chemically reactive molecular gas to an ion source that generates a divergent ion current directed at a target. The ion current contains at least one species of chemically reactive molecular ion, and the target is disposed in a chamber having a partial vacuum. A voltage source applies a bias to the target such that chemically reactive molecular ions from the ion source are accelerated toward the target with sufficient kinetic energy to dissociate at least some of the chemically reactive molecular ions by collision with the surface of the target.
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