| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
1997-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2004-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c9cc40d9aa2f6a7291b15f205d8469e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ebe8b8d3fdcf42788496d0b15ea1ec3 |
| publicationDate |
2004-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6699645-B2 |
| titleOfInvention |
Method for the formation of resist patterns |
| abstract |
Method for the formation of resist patterns by using a chemically amplified resist which comprises an alkali-insoluble base polymer or copolymer and an acid generator, in which the patternwise exposed film of said resist is developed with an organic alkaline developer in the presence of a surface active agent containing a higher alkyl group in a molecule thereof. The resist patterns have no drawback such as cracks and peeling, and thus can be advantageously used in the production of semiconductor devices such as LSIs and VLSIs. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8080364-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6992015-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013004740-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7524772-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006040215-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8841060-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009186484-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2004224525-A1 |
| priorityDate |
1996-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |