| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3b3efed64b7205e9056e52f7a88a5350
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2002-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2004-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6ea3591c72aaeb6232bf076025a54a0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23b3731c64241a8b7b5d0d4664450c01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0f3187f2c5aec73d810ebc6ddf0cb3d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_06d240aaa44c54a9ecd924b0309db955
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ecbc67e122462acc372093cc6d4c232e |
| publicationDate |
2004-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6696218-B2 |
| titleOfInvention |
Chemical amplification type positive resist composition |
| abstract |
A chemical amplification type positive resist composition that enables a resist pattern free from deformation in a side wall thereof and excellent in evenness and is excellent in sensitivity as well as resolution is provided and the chemical amplification type positive resist composition comprises a resin which has a polymerization unit derived from p-hydroxystyrene and a polymerization unit having a group unstable against acid, and is insoluble or hardly soluble in an alkaline medium itself but becoming alkaline-soluble after the acid-unstable group being cleaved by the action of the generated acid; an acid generating agent; and a compound represented by the following formula (I):wherein R<1 >and R<2 >each independently represents an alkyl group having 1 to 15 carbon atoms, an alkyl group having 1 to 8 carbon atoms wherein at least 3 hydrogen atoms are substituted by fluorine atoms, or an aryl group having 6 to 10 carbon atoms. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005042540-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7794913-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008286691-A1 |
| priorityDate |
2001-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |