| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_60e21de07fa18fc54e2150daffc14654 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P20-55 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D309-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-1804
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-734 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D309-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-734 |
| filingDate |
1994-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2003-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a34e7eb589f810dd281c60b5bfc52fe8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_87b635b1b8f8caa7d07bcd3f47246a06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f5785e9b74ea84347969d082b2e428d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_610059836a39ae8749967cd2500a26b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_082ef80ac91a9d8bb6e7bb77f3a15baf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fad35d0289d5a6bc657d243957c93ca9 |
| publicationDate |
2003-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-6667415-B1 |
| titleOfInvention |
Tertiary butyl 4,4-bis(4′-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same |
| abstract |
Disclosed are novel tert-butyl 4,4-bis(4'-hydroxyphenyl)pentanoate derivatives represented by the following general formula (I);wherein R<1 >represents a protective group which can be readily eliminated under an acidic condition, and R<2 >represents a hydrogen atom, a lower alkyl group or a lower alkoxy group: and high energy radiation-responsive positive resist materials using said novel derivatives as dissolution inhibitors. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7629105-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006210916-A1 |
| priorityDate |
1993-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |